Introduction

Our goal at Applied Thin-Film Products (ATP), an ISO9001 and AS9100 certified company, is to constantly evolve our processing and material capabilities to reflect our customers’ changing needs. Our state-of-the-art thin-film facility was founded in 1995 in the heart of Silicon Valley specifically for this purpose. ATP’s experienced personnel and representatives possess motivation and integrity, which is reflected by the reputation we enjoy in the military, aerospace, wireless, fiber-optic and medical life science marketplace.

In order to accommodate a growing global market, ATP expanded our manufacturing capacity in 2010 with the addition of a second facility located at 3620 Yale Way, Fremont, CA. This location is adjacent to the original existing building.

ATP offers build-to-print services for a wide range of materials and metallization schemes. ATP fabricates circuits on substrates using As-Fired Alumina, Polished Alumina, Superstrate TPS, Aluminum Nitride, Beryllium Oxide, Fused Silica/Quartz, Sapphire and Hi-K Dielectrics.

Metallizations range from standard films to Aluminum, Chrome, Copper, Nickel, Gold, Palladium, Platinum, Titanium and Titanium Tungsten.

Circuit features can include fine pitch conductors, integrated resistors, vias, wrap-arounds, double sided patterning, polyimide supported bridges, hollow plated vias and solid filled vias.